| 摘要 |
PURPOSE: An optical apparatus is provided to correct or minimize incapable of an image error originated from an unequal temperature distribution. CONSTITUTION: An optical apparatus for a micro-lithography system exposing with a light having a slit image field or non-symmetric rotation, comprises an optical device, for example, a lens located in a mount, or the mount or/and an actuator get in gear in the optical device. Actuators are not rotation symmetric, and the actuators generate power and/or moment escaping from a radius direction to the optical device, to curve without thickness variation.
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