发明名称 LITHOGRAPHIC PROJECTION APPARATUS AND METHOD OF FABRICATING DEVICE USING THE APPARATUS AND DEVICE MADE BY THE METHOD.
摘要 PURPOSE: A lithographic projection apparatus is provided to diminish the harmful factor like spurious motion, mechanical vibration, shock. CONSTITUTION: In an apparatus including the radiation part supplying projection light, mask table with mask holder fixing mask, substrate table with holder fixing substrate, projection system forming image of mask radiation part on target area of substrate, first operating apparatus which moves the mask table in the predetermined standard direction parallel to table surface, second operating apparatus which moves the substrate table parallel to a standard direction in accordance with the operation of mask table, the characterized apparatus comprises the first measuring means for deciding the temporal position of the mask table to a fixed standard point, the second measuring means for deciding the temporal position of the substrate table to a fixed standard point, means for transportation which compare the difference of the two position and generate the signal of position error according to the result of comparison and adjusting the temporal position of mask table to compensation the difference.
申请公布号 KR20000006321(A) 申请公布日期 2000.01.25
申请号 KR19990023221 申请日期 1999.06.21
申请人 ASM LITHOGRAPHY B.V. 发明人 BERTLER HANSE;WARMERDAM THOMAS PETRUS HENDRIKUS
分类号 H01L21/027;G03F7/20;(IPC1-7):G03F7/20 主分类号 H01L21/027
代理机构 代理人
主权项
地址