| 摘要 |
The invention concerns a method characterised in that it consists in: a) continuously producing in a first reaction zone (Z1, Z21, Z31) of the installation a phase consisting of PCl3 and PCl5, the PCl3/PCl5 molar percentage being such that the phase is capable of being pumped at the working temperature for the process; b) contacting said phase in a second reaction zone (Z2, Z22, Z32) of the installation with HF in sub-stoichiometric level relative to the PCl5 to obtain a gas with very low HF and Cl2 contents. The resulting gas mixture comprises a dichlorine content less than 10 ppm in volume and a HF content less than 50 ppm in volume. |
