发明名称 METHOD OF GROWING COMPOUND SEMICONDUCTOR
摘要 PROBLEM TO BE SOLVED: To provide a method of growing a compound semiconductor which can reduce the reevaporation of In from a growth layer and can get a growth layer favorable in surface morophogy, in the case of growing a compound semiconductor including In and not including Al. SOLUTION: In an AlGaAs semiconductor laser which has a distorted quantum well structure of active layer, an Al-doped GaInAs active layer 4 is used as an active layer. The Al-doped GaInAs active layer 4 is made by performing the growth of GaInAs so as to be doped with Al by mixing TMA as a second material including Al into the first material consisting of TMG(trimethyl gallium), TMIn, and AsH3 used for the growth of GaInAs. The supply quantity of TMA(trimethyl aluminum) and the supply ratio of TMA(trimethyl aluminum) to TMG(trimethyl gallium), TMIn, and AsH3 are controlled so that the concentration of Al in the Al-doped GaInAs active layer 4 may be 1×1018/cm3 or over and that the composition ratio of the Al in the Al-doped GaInAs active layer 4 may be 0.1 or under.
申请公布号 JP2000022208(A) 申请公布日期 2000.01.21
申请号 JP19980180931 申请日期 1998.06.26
申请人 SONY CORP 发明人 NARUI HIRONOBU;OKANO NUBUMASA
分类号 H01L21/205;H01L33/30;H01S5/00;H01S5/30 主分类号 H01L21/205
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