发明名称 WET ETCHING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a wet etching device, wherein final point detection accuracy is improved without increasing the number of optical sensors. SOLUTION: Rays from a light source 18 is made to vibrate by a vibration mirror 22, and vibration rays from the vibration mirror 22 are turned on a substrate 11 by a turning mirror 23. Rays reflected by the turning mirror 23 is enlarged linearly on the substrate 11 by a capacitor lens 24. Since the detection area on the substrate 11 is enlarged, dependence of a pattern and dispersion of etching rate on in-plane irregularities of film quality and film thickness can be averaged, and final point detection accuracy can be improved.
申请公布号 JP2000021844(A) 申请公布日期 2000.01.21
申请号 JP19980186529 申请日期 1998.07.01
申请人 TOSHIBA CORP 发明人 TAKEDA ATSUSHI
分类号 G01N21/88;G01N21/956;H01L21/306;(IPC1-7):H01L21/306 主分类号 G01N21/88
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