| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a composition excellent in a residual film ratio, resist profile, and the like to deep ultraviolet rays by containing a polymer with specific partial structure. SOLUTION: This positive photosensitive resin composition contains a compound producing acid by active light, a polymer with partial structure expressed by a formula, a nitrogen contained basic compound, and a fluorinated and/or silicone surfactant. In the formula, R1 represents methyl group or ethyl group, and R2, R3 independently represent hydroxyl group, carboxyl group, alkyl group, alkoxyl group, substitutional alkyl group, substitutional alkoxy group or cyclic alkyl group. R2 and R3 can be bonded to form a ring. X represents a bivalent organic residual group of 2-20 in the number of carbon. R4 represents hydrogen atom, alkyl group, substitutional alkyl group, cyclic alkyl group, substitutional cyclic alkyl group or a group expressed by -COOR4 and composing a group decomposed under the action of acid.</p> |
