| 摘要 |
PROBLEM TO BE SOLVED: To provide a developer for a resist, having excellent resolution selectivity capable of promoting solubility for a soluble part and retarding solubility for nonsoluble part to allow development in a short time, even in a fine resist pattern, and to provide a developing method using the developer. SOLUTION: This developer is a developer for a resist containing a basic organic compound and an ester, and the ester comprises an ester prepared out of formic acid, 1) alcohols and 2) at least one kind of compound selected from the group of alkylene oxide adducts comprising at least one kind of the compound selected from the group of alcohols, phenols and carboxylic acids. A developing method using the developer is also provided. |
