| 摘要 |
PROBLEM TO BE SOLVED: To provide a cleaning device for silicon wafers, which can improve the extent of cleaning and the cleaning capability of the surface of the silicon wafer. SOLUTION: This cleaning device for silicon wafer is provided with a wafer cassette 52 for storing a silicon wafer 50, a cleaning tank 20 filled with a cleaning liquid for cleaning the silicon wafer 50, a wafer cassette rocking means 40 for rocking the wafer cassette 52 in the cleaning tank 20, and a cleaning liquid supply means for supplying the cleaning liquid to the cleaning tank 20. The cleaning liquid supply means has a watering pipe 2 provided around the base of the cleaning tank 20.
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