| 摘要 |
PROBLEM TO BE SOLVED: To carry out scanning exposure with a constant throughput of exposure operation, while limiting the size of an image failed region in a boundary part of a sensitive substrate. SOLUTION: An optimum synchronous shifting speed for a given sectional region at an outer boundary part of a sensitive substrate (W) is determined by a main control system 20, on the basis of exposure map data stored in a memory unit 19. A reticle stage drive unit 14 and a wafer stage drive unit 16 are controlled by the main control system 20 on the basis of a determined optimum shifting speed for shifting a reticle (R) and a wafer (W) under synchronous control. The main control system 20 provides focusing control by controlling an actuator, based on the focusing control data in exposure map data.
|
