| 摘要 |
PROBLEM TO BE SOLVED: To suppress the fluctuations in the expansion ratio of a wafer in a photolithography process for operating pattern formation in a stepper to be used for the photolithography process of a semiconductor device. SOLUTION: The expansion ratio of a reticule fluctuates due to the effects of heat generated on a reticule by an exposure illuminating light, with which a reticule 102 is irradiated so that the effects of heat on the reticule due to the exposure illuminating light can be offset by a reticule part temperature adjusting mechanism 104. Also, the light energy of the exposure illuminating light, with which a wafer 106 is irradiated through a reduced optical system 105 generates heat on the wafer, and the expansion ratio of the wafer changes due to the effects of the heat. Then, a wafer temperature adjusting mechanism 110 is provided at the part of a wafer holder 107 for chucking the wafer 106. Thus, fluctuations in the expansion ratio of the wafer in a photolithography process for operating pattern formation can be suppressed, and highly accuracte pattern formation can be attained.
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