发明名称 VARNISH APPLYING RELIEF PLATE DISPENSING WITH DEVELOPING PROCESS
摘要 PROBLEM TO BE SOLVED: To eliminate a liquid developing process from an image forming method based on relief formation or the like by stripping off material of an unexposed part by a physical technique after exposing a photosensitive color coated face. SOLUTION: A composition of light fading dye and a liquid polymer is coated on a sheet of material excellent in varnish accepting transitional property. At the time of image formation, a photoengraving exposure device is used, and a photographic film is brought into close contact with a relief plate and irradiated with ultraviolet rays. A cutter is used to cut in along the outline of a colored image until reaching an interface to a PET film to strip off the material of an unexposure part to manufacture a relief plate. Rubber material is suitable for the material excellent in varnish accepting transitional property and having property close to an offset printing blanket. As the light fading dye, it is preferable to use dye fading by short-time ultraviolet exposure and forming a high-contrast image.
申请公布号 JP2000019723(A) 申请公布日期 2000.01.21
申请号 JP19980218492 申请日期 1998.06.26
申请人 NIPPON DENSHI SEIKI KK 发明人 MARUNO MASANORI
分类号 G03F7/021;G03F7/00 主分类号 G03F7/021
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