| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma treating apparatus, capable of uniformly treating a work having a large area, without making the apparatus large in size. SOLUTION: The top of a reactor chamber 2 has heat-resistive and microwave-permeable properties and moreover is hermetically sealed with a sealing plate 12 of a dielectric having low dielectric loss. At the reactor chamber 2 side of the sealing plate 12, a counter electrode 11 having an opening 11a faces a stage 7, the seal plate 12 has a protrusion fitted in an opening 11a of the counter electrode 11, the lower face of the protrusion is flush with that of the counter electrode 11, and a high frequency power source 9 is connected to the stage 7 so as to ground the counter electrode 11. |
