摘要 |
<p>PROBLEM TO BE SOLVED: To provide a pattern inspection device which eliminates an erroneous detection of false defect macroscopically, and enables high defect detection accuracy microscopically. SOLUTION: This pattern inspection device is provided with an observation data generation part (6, 4, 2, 5, 7, 14, 21) which generates detection pattern data S22 from a sample 1 to be measured, a first memory unit 55 which stores the detection pattern data S22, a reference data generation part 13, 19 which generates reference data for inspecting standards, a second memory unit 56 which stores the reference data, a contact hole inspection and investigation means 16 which receives the output of the first memory unit 55, detects the presence of a contact hole-like pattern in the detection pattern data S22, and recognizes the amount of light and the dimensions, a third memory unit 57 which stores ideal amount of light and of dimensions, and a comparator circuit 11 which inputs the output of the first and second memory units 55 and 56 and the output of the contact hole inspection and investigation means 16.</p> |