CHEMICAL VAPOR DEPOSITION APPARATUS EMPLOYING LINEAR INJECTORS FOR DELIVERING GASEOUS CHEMICALS AND METHOD

摘要

There is provided a chemical vapor deposition apparatus for depositing substantially uniform films or layers onto a substrate or wafer. The apparatus includes a chamber (11) with an injector assembly (12) including spaced linear injectors (16) and a chemical vapor delivery system for delivering chemicals to said injectors (16) to form spaced adjacent deposition regions. Translation means (44) reciprocally move said substrate or wafer a predetermined distance in a direction perpendicular to the long axis of the linear injectors (16) while maintaining the substrate surface parallel and adjacent to the chemical delivery surface of the linear injector assembly (12) whereby the deposition regions of adjacent injectors merge to form a film or layer of substantially uniform thickness.