发明名称 System and method for measuring layer thickness on substrates utilize the motion of the substrates relative to a measuring head during their transport along a given track
摘要 The system (2) determines the layer thickness variation on a substrate (4) by means of a measuring head (20, 24) during continuous transport of the substrate relative to the measuring head. An Independent claim is also included for a method which involves provision of a measuring system working on transmission or reflection principle, displacement of the substrate through the measuring system along a measurement track, and evaluation of the signals produced by the measuring head to obtain information about the layer thickness variation on the substrate.
申请公布号 DE19830794(A1) 申请公布日期 2000.01.20
申请号 DE19981030794 申请日期 1998.07.09
申请人 SINGULUS TECHNOLOGIES AG 发明人 RUETH, EDGAR;SICHMANN, EGGO;WOHLFART, PETER
分类号 C23C14/54;G01B11/06;G01B15/02;G11B7/26;(IPC1-7):G01B11/06;C23C16/52;G11B7/24 主分类号 C23C14/54
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