| 摘要 |
<p>An ionized PVD apparatus (10) comprises an RF coil (30) surrounding space (11) within vacuum chamber (12). RF energy is coupled into the space (11) to form a secondary plasma between the substrate holder (14) and the target (16). A window (60) of dielectric material, in an opening of the wall (13) of the chamber (12), protects the coil (30) from adverse interaction with secondary plasma. Shield (100) is provided to prevent coating of window (60). Shield (100) is partitioned or slotted to form a gap (103) to prevent induced currents in the shield segments. Such shield configuration maximizes the available power to support the secondary plasma by preventing the formation of eddy currents which can heat the shield.</p> |
