REMOVING METAL IONS FROM WASTEWATER

摘要

A novel process and apparatus are disclosed for cleaning wastewater containi ng metal ions in solution, hydrogen peroxide, and high solids, e.g., greater th an about 50 mg/l particulate solids. A carbon adsorption column removes hydroge n peroxide in the wastewater feed containing high solids. A chemical precipitation unit removes the metal ions from solution. The process and apparatus remove metal ions such as copper from a high solids byproduct polishing slurry from the chemical mechanical polishing (CMP) of integrated circuit microchips to form an environmentally clean wastewater discharge.