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发明名称
Reinigungsverfahren
摘要
申请公布号
DE69131853(D1)
申请公布日期
2000.01.20
申请号
DE19916031853
申请日期
1991.03.15
申请人
TOSHIBA SILICONE CO., LTD.;JAPAN FIELD CO., LTD.
发明人
INADA, MINORU;KABUKI, KIMIAKI;IMAJO, YASUTAKA;YAGI, NORIAKI;SAITOH, NOBUHIRO
分类号
B01D12/00;C08G65/00;C08L71/02;C11D1/29;C11D1/34;C11D1/40;C11D1/62;C11D1/74;C11D3/00;C11D3/16;C11D3/18;C11D3/20;C11D3/37;C11D3/43;C11D7/24;C11D7/26;C11D7/28;C11D7/50;C11D11/00;C23G5/02;C23G5/024;C23G5/032;C23G5/04;H05K3/26;(IPC1-7):C23G5/02
主分类号
B01D12/00
代理机构
代理人
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地址
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