| 摘要 |
<p>A material for forming a bottom reflection preventive film in photolithography, which contains a polymeric dye having repeating units having cylic acetal groups and represented by formula (1). The composition has film-forming properties and gives a bottom reflection preventive film which shows absorption at the waelength of exposure light, is satisfactory in step coverage and non-intermixing with a photoresist layer, and has a high etching rate. [R represents H, optionally substituted alkyl, cycloalkyl, or aryl; R1 represents optionally substituted alkyl or aryl or -COOR3 (R3 represents alkyl); R2 represents optionally substituted alkyl, cycloalkyl, or aryl; D is an organic chromophore absorbing exposure light at wavelengths of 150 to 450 nm and represents optionally substituted aryl, fused aryl, or heteroaryl; m and o each is an integer larger than 0; and n, p, and q each is an integer of 0 or larger.].</p> |
