Method for forming a photomask

摘要

A fabrication process for a multi-layer photomask. A transparent substrate is provided. An anti-reflecting layer is formed on the substrate. First blinding blocks are formed on the anti-reflecting layer by defining a first blinding layer. A transparent layer is formed along the profile of the structure surface described above. Second blinding blocks are formed on the transparent layer between the first blinding blocks by defining a second blinding layer, wherein a part of the transparent layer on the first blocks is exposed.