发明名称 SUBSTRATE FILM FOR PHOTOCATALYTIC FILM, FORMATION THEREOF AND ARTICLE COMPRISING BASE MATERIAL HAVING PHOTOCATALYTIC FILM FORMED USING SUBSTRATE FILM FOR PHOTOCATALYTIC FILM
摘要 PROBLEM TO BE SOLVED: To provide an inorganic substrate film for photocatalytic films which enables low-temperature calcining through a sol-gel method, may be applied to various substrates with a good adhesion and has a good processibility, a formation process thereof and an article comprising a base material equipped with a substrate film for photocatalytic films and a photocatalytic film. SOLUTION: A substrate film 1 for photocatalytic films is equipped with both a dense inner layer with is essential as a barrier layer applied between the photocatalytic film and the substrate and a rough surface layer which exerts a high adhesion to the photocatalytic film, essentially comprises SiO2 and is formed through a sol-gel method, wherein a rough surface 3 is monolithically formed on the dense layer 2, and fine asperities are formed on the entire surface of the rough surface 3 for roughing. In a formation process of the substrate film, a sol, obtained by stirring a mixture of a liquid composition comprising a silane compound of the formula: R1nSi(OR2)4-n, a solvent, water, an acid catalyst and SiO2 fine particles, is applied to a substrate and dried to form a gel film, and then calcined.
申请公布号 JP2000017229(A) 申请公布日期 2000.01.18
申请号 JP19980183632 申请日期 1998.06.30
申请人 SHOWA ALUM CORP 发明人 NISHIMORI HIDEKI;HASHIMOTO AKIRA;TADA KIYOSHI
分类号 A61L9/00;C09D5/00;C09D183/04;C09K3/00;C09K3/18;(IPC1-7):C09D183/04 主分类号 A61L9/00
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