发明名称 |
Stable inorganic polymers |
摘要 |
Processes for producing poly (hydrido siloxane) copolymers and processes for producing solutions of such copolymers for coating semiconductor substrates are provided. The copolymers have the general formula: (HSiO1.5)a(HSiO(OR))b(SiO2)c, wherein R is a mixture of H and an alkyl group having between 1 and 4 carbon atoms; a+b+c=1; 0.5<a<0.99; 0.01<b<0.5; and 0<c<0.5. Processes for producing the copolymers use alkoxysilanes as starting materials. Processes for producing coating solutions include removal of water and alcohol. Films of such coating solutions are useful as planarizing dielectric layers.
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申请公布号 |
US6015457(A) |
申请公布日期 |
2000.01.18 |
申请号 |
US19980039289 |
申请日期 |
1998.03.12 |
申请人 |
ALLIEDSIGNAL INC. |
发明人 |
LEUNG, ROGER Y.;NAKANO, TADASHI |
分类号 |
C08G77/12;H01L21/312;(IPC1-7):C08G77/04 |
主分类号 |
C08G77/12 |
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地址 |
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