| 摘要 |
PROBLEM TO BE SOLVED: To uniformly hold the deposition rate regardless of the positional relation between an anode and a substrate and to obtain a uniform film at a high deposition rate by forming an electrodepositing tank holding an electrodepositing bath of an electrodeposition device continuously depositing oxide on a long-size substrate of metal and allowing the inside of the electrodepositing tank to be electrically floated. SOLUTION: In an electrodeposition device in which oxide is deposited on a long-size substrate 1 by electrodepositing, an electrodepositing tank 9 holding an electrdepositing bath 16 is formed of metal, and the inside of the electrodepositing tank 9 is electrically floated. As the metal of the electrodepositing tank 9, SUS, Fe, Al, Cu, Cr, brass or the like can be utilized. The electrical floating in the electrodepositing tank 9 can be executed, e.g. by inserting a spacer 67 of dielectric substance such as 'Taflon (R)', 'Derlin (R)' into the space between a frame 66 supporting the electrodepositing tank 9 and the electrodepositing tank 9. In this way, even if the distance between the anode 17 and the long-size substrate 1 is changed, e.g. an electrodeposited zinc oxide film can uniformly be formed at a high carrying speed of the long- size substrate 1 with a uniform thickness.
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