发明名称 MgO FILM FORMING METHOD AND PANEL
摘要 PROBLEM TO BE SOLVED: To execute the formation of a stable thin film of MgO on a glass substrate by continuously stabilizing a plasma discharge at the time of forming the thin film of the MgO by using a vacuum deposition apparatus. SOLUTION: A plasma beam 22 is formed toward the inside of a vacuum chamber 12 by a plasma gun 11 of the vacuum deposition apparatus 10. A short pipe part 12A projects toward the output part of the plasma gun 11 and is provided with a converging coil 18 so as to enclose the short pipe part 12A. The MgO 20 in a crucible 19 is evaporated by the plasma beam 22 and the thin film of the MgO is formed on the substrate 13 by the evaporated MgO 20. The output part of the plasma gun 11 is provided with an electron feedback electrode 2 enclosing the circumference of the plasma beam 22. The reflection electron current 3 generated from the plasma beam 22 is fed back to the electron feedback electrode 2.
申请公布号 JP2000017431(A) 申请公布日期 2000.01.18
申请号 JP19980181213 申请日期 1998.06.26
申请人 DAINIPPON PRINTING CO LTD 发明人 DAITO RYOICHI;IWAMOTO YOJI
分类号 C23C14/08;C23C14/32;(IPC1-7):C23C14/32 主分类号 C23C14/08
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