| 摘要 |
PURPOSE:To improve sensitivity and definition by using an org. silicone polymer obtd. by substituting the OH groups remaining when an org. silicon compd. is subjected to a hydrolysis and dehydration condensation polymn. with a triorgano-siloxy group as a chief material. CONSTITUTION:This resist compsn. consists of the org. silicon polymer obtd. by substituting the OH groups remaining in the molecules of the polymer obtd. when the org. silicon compd. expressed by formula I is subjected to the hydrolysis and dehydration condensation polymn. with the triorgano-siloxy group expressed by formula II, a crosslinking agent which is made active in the presence of protonic acid, an acid generating agent which generates the protonic acid by ionizing radiations, and an org. solvent. In the formulas I, II, R1 denotes any of hydrogen, trialkoxysilyl group and trichlorosilyl group and >=2 of R1s are trialkoxysilyl group or trichloro silyl group; R2 denotes (CH2)mCOOH, (CH2)n-N-COOH, lower alkyl group, aryl group or lower alkenyl group; >=20% is (CH2)mCOOH, etc. The negative type resist having the excellent sensitivity and definition is obtd. in this way. |
