LAYOUT STRUCTURE OF MASK PATTERNS

摘要

PURPOSE: A mask pattern layout structure is provided to improve a margin of design rule by forming a pattern located at side surface more narrow width compared to the width of the desired patterns. CONSTITUTION: The layout structure of mask patterns comprises a first pattern region(310) having a plurality patterns arranged in parallel with each other; and a second pattern region(320) having a single pattern on the mask(300) and separating the first pattern region(310), wherein the outmost pattern in the first pattern regions(310) has narrow width than that of the different patterns and the single pattern of the second pattern regions(320) has same width to the outmost pattern.