ETCHING DEVICE FOR SEMICONDUCTOR DEVICE AND ETCHING METHOD

摘要

PURPOSE: An etching device for a semiconductor device is provided to improve the reliability and the productivity of a semiconductor manufacture by easily controlling the process under the desired condition in the etching process. CONSTITUTION: The etching device comprises: a bass(20) for containing a chemical for a semiconductor etching diluted into a deionized water; a heater(22) for heating the contained chemical at a certain temperature; a cover for closing the whole face of the bass to prevent the deionized water diluted with the chemical from evaporating outside on when heating the chemical.