发明名称 |
POLYSILICON-THIN FILM TRANSISTOR AND MANUFACTURING METHOD THEREOF |
摘要 |
PURPOSE: A polysilicon-thin film transistor and the manufacturing method at a liquid crystal display device are provided to prevent electric current from leaking when turning off and to increase an electric field moving extent. CONSTITUTION: The polysilicon-thin film transistor comprises: a substrate(11); a first gate(12) formed on the specific part of the substrate; a channel layer made into polysilicon and formed on the upper substrate and the upper oxide film of the surface of the first gate; a gate insulating film(16) and a second gate(17) formed on the specific part of the channel layer; and a source, drain area formed on the channel layer of both sides of the second gate.
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申请公布号 |
KR20000003105(A) |
申请公布日期 |
2000.01.15 |
申请号 |
KR19980024217 |
申请日期 |
1998.06.25 |
申请人 |
HYUNDAI ELECTRONICS IND.CO.,LTD |
发明人 |
IN, TAE HYUNG |
分类号 |
H01L29/49;(IPC1-7):H01L29/49 |
主分类号 |
H01L29/49 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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