发明名称 |
NONVOLATILE MEMORY DEVICE HAVING IMPROVED FLOATING GATE COUPLING RATIO AND ITS FABRICATING METHOD |
摘要 |
PURPOSE: The device improves the coupling ratio of a floating gate and has an active region with flat surface to maintain the capacitance constantly between the floating gate and a channel. CONSTITUTION: The device is formed on a semiconductor substrate(100) in an active region and is formed continuously in one region, and comprises a gate insulation film(130a, 130b) having a different thickness in a center region and in an edge region of the active region. The gate insulation film in the edge region of the active region adjacent to a field oxide(120) is formed thickly to prevent tunneling and is formed so thick that tunneling can be occurred.
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申请公布号 |
KR20000003055(A) |
申请公布日期 |
2000.01.15 |
申请号 |
KR19980024151 |
申请日期 |
1998.06.25 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
JANG, DONG SOO;NAM, SUNG WOO;OH, HUNG KWEUN |
分类号 |
H01L27/10;H01L27/115;(IPC1-7):H01L27/10 |
主分类号 |
H01L27/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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