发明名称 NONVOLATILE MEMORY DEVICE HAVING IMPROVED FLOATING GATE COUPLING RATIO AND ITS FABRICATING METHOD
摘要 PURPOSE: The device improves the coupling ratio of a floating gate and has an active region with flat surface to maintain the capacitance constantly between the floating gate and a channel. CONSTITUTION: The device is formed on a semiconductor substrate(100) in an active region and is formed continuously in one region, and comprises a gate insulation film(130a, 130b) having a different thickness in a center region and in an edge region of the active region. The gate insulation film in the edge region of the active region adjacent to a field oxide(120) is formed thickly to prevent tunneling and is formed so thick that tunneling can be occurred.
申请公布号 KR20000003055(A) 申请公布日期 2000.01.15
申请号 KR19980024151 申请日期 1998.06.25
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 JANG, DONG SOO;NAM, SUNG WOO;OH, HUNG KWEUN
分类号 H01L27/10;H01L27/115;(IPC1-7):H01L27/10 主分类号 H01L27/10
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