发明名称 |
WAFER RECYCLING METHOD FOR SEMICONDUCTOR DEVICE PRODUCTION |
摘要 |
PURPOSE: A wafer recycling method for a semiconductor production is provided for an economic gain by recycling a specific pattern formed wafer for production. CONSTITUTION: The wafer recycling for a semiconductor device production is performed in the process of; grinding the face of a wafer film from the back of the wafer for production; rough polishing the back of the wafer for production from which a specific film is removed; polishing the face of the wafer for production; washing the wafer for production.
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申请公布号 |
KR20000002959(A) |
申请公布日期 |
2000.01.15 |
申请号 |
KR19980023974 |
申请日期 |
1998.06.24 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
CHO, KYU CHUL;HUH, TAE YUL;KANG, KYONG LIM;PARK, JAE KEUN |
分类号 |
H01L21/66;(IPC1-7):H01L21/66 |
主分类号 |
H01L21/66 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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