发明名称 WAFER RECYCLING METHOD FOR SEMICONDUCTOR DEVICE PRODUCTION
摘要 PURPOSE: A wafer recycling method for a semiconductor production is provided for an economic gain by recycling a specific pattern formed wafer for production. CONSTITUTION: The wafer recycling for a semiconductor device production is performed in the process of; grinding the face of a wafer film from the back of the wafer for production; rough polishing the back of the wafer for production from which a specific film is removed; polishing the face of the wafer for production; washing the wafer for production.
申请公布号 KR20000002959(A) 申请公布日期 2000.01.15
申请号 KR19980023974 申请日期 1998.06.24
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 CHO, KYU CHUL;HUH, TAE YUL;KANG, KYONG LIM;PARK, JAE KEUN
分类号 H01L21/66;(IPC1-7):H01L21/66 主分类号 H01L21/66
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