发明名称 METHOD FOR FABRICATING STATIC RANDOM ACCESS MEMORY CELL
摘要 PURPOSE: A method is for fabricating a static random access memory cell to enhance the reliability and the integrity of a device through process improvement, because the ill production rate and the cell size is increased due to the short problem of a contact and a bottom conduction layer. CONSTITUTION: A method can reduce the separation distance due to the short prevention or an overlay by; depositing a nitride film on top and on both sides of a word line(47A) and a ground potential line(47B); forming a first contact(49A) where one junction part of an access transistor(100) is revealed, and forming a second contact(49B) where the other junction part of the access transistor and a gate of a drive transistor(44B) are revealed; and forming a conductive pattern connected to the first and to the second contact respectively.
申请公布号 KR20000001438(A) 申请公布日期 2000.01.15
申请号 KR19980021703 申请日期 1998.06.11
申请人 HYUNDAI ELECTRONICS IND. CO., LTD. 发明人 KONG, MYOUNG KUK
分类号 H01L21/8244;(IPC1-7):H01L21/824 主分类号 H01L21/8244
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