发明名称 |
METHOD FOR FABRICATING STATIC RANDOM ACCESS MEMORY CELL |
摘要 |
PURPOSE: A method is for fabricating a static random access memory cell to enhance the reliability and the integrity of a device through process improvement, because the ill production rate and the cell size is increased due to the short problem of a contact and a bottom conduction layer. CONSTITUTION: A method can reduce the separation distance due to the short prevention or an overlay by; depositing a nitride film on top and on both sides of a word line(47A) and a ground potential line(47B); forming a first contact(49A) where one junction part of an access transistor(100) is revealed, and forming a second contact(49B) where the other junction part of the access transistor and a gate of a drive transistor(44B) are revealed; and forming a conductive pattern connected to the first and to the second contact respectively.
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申请公布号 |
KR20000001438(A) |
申请公布日期 |
2000.01.15 |
申请号 |
KR19980021703 |
申请日期 |
1998.06.11 |
申请人 |
HYUNDAI ELECTRONICS IND. CO., LTD. |
发明人 |
KONG, MYOUNG KUK |
分类号 |
H01L21/8244;(IPC1-7):H01L21/824 |
主分类号 |
H01L21/8244 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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