DOUBLE EXPOSING APPARATUS

摘要

PURPOSE: A double exposing apparatus having two exposing masks is provided to easily align of mask and correct defects of mask using a plurality of reflection mirrors. CONSTITUTION: The apparatus comprises a first reflection mirror(13) formed at a light source(11); a second reflection mirror(14) for reflecting an incident light to a lower part; a first condenser lens(15) for condensing the reflected light; a third and forth reflection mirrors(19,21) for reflecting an image of a first mask(17) to a coherent lens(23); a sixth reflection mirror(29) for reflecting a reflected light from a fifth reflection mirror(27) to a lower part; a second condenser lens(31) for condensing the reflected light; a seventh and eight reflection mirrors(35,37) for reflecting an image of a second mask(33); and a semiconductor substrate(25) for transferring the images of the first and second masks to form at lower part of the coherent lens(23).