SHUTTER FOR SPUTTERING DEVICE

摘要

PURPOSE: A shutter for a sputtering device is provided to simplify the process and shorten the evaporating time, improving the efficiency. CONSTITUTION: The sputtering device comprises; a chamber(22) equipped with a vacuum pump(21); a target part(23) to be attached with a target(30); a substrate part(24) equipped with a substrate(25) where material of target(23) will be evaporated; a reaction gas valve(27) to inject a reaction gas; a magnetron(28) to expedite the generation of an ion gas; a shutter(26) to control the evaporating time.