| 摘要 |
PURPOSE: A method for forming a metal and ceramic mixed composite material thin film by coating a thin film or a metal and ceramic mixed composite material thin film on the surface of plastic base plate simultaneously using a reactive plasma coating method is provided. CONSTITUTION: In plasma coating apparatus, a vacuum chamber(13) is pumped to maintain under the fixed vacuum condition by a vacuum pump(12), a reaction gas is blown into the vacuum chamber(13), plasma is produced by switching on the electric source of magnetron(2)(8), metal gas and ceramic gas evaporated from a metal target(3) and a ceramic target(9) are coated on the surface of the plastic base plate(4) to give the composite material thin film. At this time, a coating speed is controlled at a speed of 0.5-2 micro meter/min by a high-power magnetron sputtering method, a conductivity of composite material thin film is regulated at 10¬3-10¬9 ohm/cm¬2.
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