SOURCE HEAD ASSEMBLY OF ION IMPLANTOR FOR SEMICONDUCTOR DEVICE PRODUCTION

摘要

PURPOSE: A source head assembly of an ion implanter for a semiconductor device production is provided to prevent to exclude a gas feed tube from an arch chamber by changing the contacting location of the arch chamber of the gas feed tube of the ion implanter from the side to the lower face. CONSTITUTION: The source head assembly of the ion implanter for the semiconductor device production comprises: a gas feed tube(5) to supply the gas as an ion source by contacting in an arch chamber(1), to joint in the lower face of the arch chamber(1); the gas inflowed into the arch chamber(1) via the lower face of the arch chamber(1).