PHOTORESIST FILTERING MACHINE OF A SEMICONDUCTOR DEVICE

摘要

PURPOSE: A photoresist filtering machine of a semiconductor device is provided to prevent coating inferiority of a photoresist and a contamination of a nozzle tip by discharging a filtered photoresist and to prevent bubbles from being inputted into the filtered photoresist by a filter. CONSTITUTION: The photoresist filtering machine comprises: a filter(300) for filtering a photoresist; a filter housing(100) for containing the filter; a coverlet for covering the filter housing; an in-line connecting portion(410) for supplying the filter with the photoresist, wherein the in-line connecting portion is attached to the coverlet and passes the coverlet; an out-line connecting portion(430) for discharging the photoresist filtered by the filter, wherein the out-line connecting portion is attached to the coverlet and passes the coverlet; and a bubble flow-in preventing tube(435) for flowing the filtered photoresist by the filter in the out-line connecting portion, wherein one end of the tube is connected to a lower part of the out-line connecting portion and the other end thereof is extended in the filter housing and below the altitude of the filter.