| 发明名称 |
PHOTO SENSITIVE POLYMER HAVING BACKBONE OF CIRCULAR STRUCTURE AND REGIST CONSTITUTION |
| 摘要 |
PURPOSE: A photosensitive polymer is provided to fully secure the tolerance for dry-type etching. CONSTITUTION: A photo sensitive polymer is composed of: 1-15wt% of PAG with a standard of polymer weight; the PAG is one or composition selected among triarylsulfonium salts, diaryliodonium salts, and sulfonates.
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| 申请公布号 |
KR20000000652(A) |
申请公布日期 |
2000.01.15 |
| 申请号 |
KR19980020395 |
申请日期 |
1998.06.02 |
| 申请人 |
SAMSUNG ELECTRONICS CO., LTD |
发明人 |
CHOI, SANG JUN |
| 分类号 |
H01L21/027;C08F120/30;C08F220/30;C08F236/20;G03F7/004;G03F7/039;(IPC1-7):G03F7/039 |
主分类号 |
H01L21/027 |
| 代理机构 |
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