发明名称 |
METHOD FOR INCREASING DIELECTRIC SURFACE AREA OF TANTALUM CAPACITOR |
摘要 |
PURPOSE: A fabrication method of tantalum capacitor is provided to increase a dielectric surface area of tantalum capacitor. CONSTITUTION: The increasing method of dielectric surface area of tantalum capacitor comprises the steps of: a molding step(100) of mixing a polyurethane as a binder to a tantalum powder and inserting a tantalum wire(12) used as an anode lead wire to a pellet; a sintering step(200) of heating the molded tantalum powder in a vacuum furnace(20) at temperature of 1600-2000°C to remove the polyurethane; and a forming step(300) of a dielectric layer such as Ta2O5 on the surface of the tantalum device(10) by applying a DC voltage. |
申请公布号 |
KR20000001245(A) |
申请公布日期 |
2000.01.15 |
申请号 |
KR19980021419 |
申请日期 |
1998.06.10 |
申请人 |
DAEWOO ELECTRONICS COMPONENTS CO., LTD. |
发明人 |
CHOE, CHANG GU |
分类号 |
H01G9/02;H01L21/31 |
主分类号 |
H01G9/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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