METHOD FOR PREVENTING POLISHING MATERIAL USED FOR CHEMICAL MECHANICAL POLISHING PROCESS FROM CONDENSING

摘要

PURPOSE: A method for preventing a polishing material used for a chemical mechanical polishing process from agglomerating is provided. CONSTITUTION: A method for preventing a polishing material from condensing comprises: measuring periodically a concentration of hydrogen ion(pH) of a polishing liquid; adding a basic solution to the polishing liquid in case of a less value than a standard pH for maintaining the pH of the polishing liquid containing the polishing material; and a high purity colloidal solution formed by mixing fumed silica particles in a basic solution for being used as the polishing liquid.