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发明名称
METAL LINE FORMING METHOD IN SEMICONDUCTOR DEVICE
摘要
申请公布号
KR100238224(B1)
申请公布日期
2000.01.15
申请号
KR19960080095
申请日期
1996.12.31
申请人
SAMSUNG ELECTRONICS CO, LTD.
发明人
HA, DAE-WON;NOH, BYUNG-HYUK
分类号
H01L21/28;(IPC1-7):H01L21/28
主分类号
H01L21/28
代理机构
代理人
主权项
地址
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