PHASE INVERSION MASK FORMING METHOD

摘要

PURPOSE: A phase inversion mask forming method is provided to prevent damages to the photo interceptive layer by forming a photo interceptive layer on the top or at the back of the transparent substrate. CONSTITUTION: The phase inversion mask forming method comprises steps of; layering a phase inversion layer(120) on the top of the transparent substrate(110); forming a photoresist layer(130) on the phase inversion layer(120); patterning a photoresist layer(130) and forming an opening(160) to expose part of the inversion layer(120); forming a photo translucent layer(140) by oxidizing phase inversion layer(120).