CONTACT CREATING METHOD OF SEMICONDUCTOR EQUIPMENT

摘要

PURPOSE: A contact creating method of a semiconductor equipment is provided to increase the contact resistance of a storage electrode and decrease the process cost. CONSTITUTION: The contact creating method of a semiconductor equipment comprises the steps of: forming a conductive film pad(104) that is electrically connected with a semiconductor substrate(100) and an insulating layer(106) on the semiconductor substrate; forming a contact hole(108) by etching the insulating layer until a part of the surface layer(107) of the conductive film pad; doping the surface layer of the pad; and forming a contact electrode(109) by filling the contact hole with the conductive layer.