HALFTONE TYPE PHASE SHIFT MASK, BLANK FOR HALFTONE TYPE PHASE SHIFT MASK, AND PRODUCTION OF HALFTONE TYPE PHASE SHIFT MASK

摘要

PROBLEM TO BE SOLVED: To provide a halftone type phase shift mask capable of having good optical characteristics to both exposure light ArF (wavelength = 193 nm) of a short wavelength and inspection light (wavelength = 365 nm) of a relatively long wavelength. SOLUTION: The transparent base material 2 of the halftone type phase shift mask constituted by laminating a semi-transparent phase shift film 3a of a prescribed pattern shape on the transparent base material 2 is formed of calcium fluoride as an essential component. This translucent phase shift film 3a is formed to include a zirconium silicide. The reflectivity to the exposure light of the short wavelength may be decreased and the transmittance to the inspection light of the relatively long wavelength may be decreased.