发明名称 PLASMA TREATMENT DEVICE
摘要 PROBLEM TO BE SOLVED: To prevent the reduction in sealing performance and change in physical property of a sealing plate for covering an inlet window of microwave by the action of a high temperature generated in a reaction vessel during plasma treatment, and perform a stable plasma treatment over a long period. SOLUTION: In a structure of sealing an inlet window 2 of microwave provided on one side of a reaction vessel 1 by a plurality of sealing plates supported by a support frame 30 erected thereon, a medium passage 7 is provided on the support frame 30, and cooling water is supplied to the medium passage 7 to cool the sealing plates 3... supported in the opening part of the support frame 30 together with airtight sealing O-rings 6... by the heat exchange with the cooling water carried in the medium passage 7.
申请公布号 JP2000012291(A) 申请公布日期 2000.01.14
申请号 JP19980174478 申请日期 1998.06.22
申请人 SUMITOMO METAL IND LTD 发明人 KOMACHI KYOICHI;IIO KOICHI;YOSHIKI TAKAHIRO
分类号 H05H1/46;C23C16/50;C23C16/511;C23F4/00;H01L21/205;H01L21/302;H01L21/3065 主分类号 H05H1/46
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