发明名称 PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE ELEMENT USING THE SAME
摘要 PROBLEM TO BE SOLVED: To obtain a photosensitive resin compsn. excellent in alkali developability by incorporating a vinyl copolymer obtained by using a specified monomer as a copolymer component, an ethylenically unsatd. compd. and a photopolymn. initiator. SOLUTION: This photosensitive resin compsn. contains a vinyl copolymer obtd. using monomers represented by formulae I, II and III as copolymerizable components, an ethylenically unsatd. compd. and a photopolymn. initiator. In the formula I, R1-R5 are each independently methyl or H and (n) is an integer of 1-5. In the formula II, R6 is H or methyl and R7 is a 1-3C alkyl. In the formula III, R8 is H or methyl and R9 is a 10-22C alkyl. The amts. of the monomers of the formulae I, II and III to be copolymerized are preferably 10-30 wt.%, 10-40 wt.% and 30-80 wt.%, respectively. The wt. average mol.wt. of the vinyl copolymer is preferably 30,000-200,000, in particular 50,000-150,000.
申请公布号 JP2000010278(A) 申请公布日期 2000.01.14
申请号 JP19980172318 申请日期 1998.06.19
申请人 HITACHI CHEM CO LTD 发明人 TANAKA YOJI;KIMURA HAKUSEI;OZAWA KYOKO
分类号 G03F7/027;G03F7/033;H05K3/06;H05K3/18 主分类号 G03F7/027
代理机构 代理人
主权项
地址