发明名称 FIELD-EFFECT TRANSISTOR AND MANUFACTURE THEREOF
摘要 PROBLEM TO BE SOLVED: To freely set the threshold voltage Vth of a field-effect transistor, without doping impurities. SOLUTION: A field-effect transistor has a first gate electrode 7, which is positioned at the central part of the transistor, and second gate electrodes 8, which are positioned on both sides of the electrode 7, and at least one part of each of the second gate electrodes 8 is positioned on a channel formation region. As the materials for the electrodes 7 and 8, materials having different work functions are used. A first gate electrode length is set in the range that an electric field from the electrode 7 and electric fields from the electrodes 8 cause interference with each other. The electrode length is preferably set in a length of 40 nm or shorter.
申请公布号 JP2000012851(A) 申请公布日期 2000.01.14
申请号 JP19980177511 申请日期 1998.06.24
申请人 NEC CORP 发明人 KO RISHO
分类号 H01L29/78;H01L29/786;(IPC1-7):H01L29/78 主分类号 H01L29/78
代理机构 代理人
主权项
地址