| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide an inspection device for which especially suitable maintenance can be carried out, for instance, when the circuit pattern of a semiconductor wafer or the like is inspected by using an electron beam. SOLUTION: This device is constituted by providing an irradiation means 24 for irradiating an electron beam on a sample surface, an electron detection means 38 to detect a secondary beam formed from at least either secondary electrons emitted from the sample surface or reflected electrons from it, a projection electro-optical system 34, 36, 37 that is arranged between the sample and the electron detection means 38, and causes the secondary beam to form images on the detection surface of the electron detection means 38, and thus projects the image of the sample surface on the detection surface, and transmittance measurement means (47, 41) to measure the transmittance that is a ratio of the current quantity of the electron beam irradiated on the sample surface to that of the secondary beam detected by the electron detection means 38.</p> |
