| 摘要 |
PROBLEM TO BE SOLVED: To inspect shadow mask irregularity with a standardized method regardless of types of the shadow mask irregularity without being affected by components of the intensity distribution of transmitted light due to design which are present in the shadow mask to which an offset cone process or a grating process was performed. SOLUTION: This inspection device is provided with a transmitting light source 1, a diffusion plate 2 that uniforms the light which the transmitting light source 1 radiates and thereby illuminates a shadow mask 3, an object lens 4 to focus the light transmitted through the shadow mask 3, a solid state image pickup element 5 to convert the optical image of the shadow mask 3 focused by the object lens 4 into an electrical image signal according to the light intensity, and an image processing part 6 that obtains a polynomially approximated wave shape of the image signal and calculates the difference between the image signal and the polynomially approximated wave shape. |
