发明名称 METHOD AND APPARATUS FOR INSPECTING SURFACE ROUGHNESS
摘要 PROBLEM TO BE SOLVED: To efficiently inspect surface roughness such as surface scratches, deposited foreign matter, etc., at high precision. SOLUTION: The surface roughness inspecting apparatus 10 comprises an oblique illuminator 12 for obliquely irradiating a surface 8 to be inspected with a light 13, illuminated image pickup unit 15 for picking up an image with illumination upon receipt of a regular reflection light 14 from the surface 8 to be inspected, and judging unit 22 for judging the surface roughness by comparing the lightness of the image on the illuminated image pickup unit 15 with that stored in a memory 21. When the oblique illuminator 12 radiates the light 13 obliquely toward the surface 8 to be inspected, the regular reflection light 13 from the surface 8 to be inspected forms an image of the surface 8 to be inspected on an image pickup face 18a of the illuminated image pickup unit 15 by the illuminated image pickup, the judging unit 22 compares the lightness of the image of the illuminated image pickup unit 15 with that in the memory 21 to detect a foreign matter 6 on the surface 8 to be inspected, thus the roughness can be recognized, irrespective of the surface color and properties of the surface to be inspected and the surface to be inspected can be efficiently and precisely inspected.
申请公布号 JP2000009452(A) 申请公布日期 2000.01.14
申请号 JP19980191041 申请日期 1998.06.22
申请人 HITACHI TOBU SEMICONDUCTOR LTD 发明人 WATABE NORIO;NISHIYAMA RYOYA;IIJIMA YASUO
分类号 G01B11/24;G01B11/30;G01N21/88;G01N21/94;G01N21/956;H01L21/66;(IPC1-7):G01B11/30 主分类号 G01B11/24
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