| 摘要 |
PROBLEM TO BE SOLVED: To minimize damages which a region around an opening part, a rectangular aperture or the like of a picture drawing pattern formed on a mask incurred when an electron beam exposure device and to restrain the occurrence of the meltdown of the region. SOLUTION: In an electron gun, where a cathode C and a first grid G1 are arranged on the high-voltage side of a high-voltage insulator and an anode A is arranged on its low-voltage side, a second grid G2 having an aperture AP for limiting the passing quantity of an electron beam EB is arranged on the high-voltage side of the high-voltage insulator and between the first grid G1 and the anode A. Then, a voltage that forms a forward bias with respect to the cathode C is applied to the second grid G2, so that a crossover image XO is made to be formed at the position of the aperture AP of the second grid G2.
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